Cubic boron nitride films by d.c. and r.f. magnetron sputtering: layer characterization and process diagnostics
- 1 August 1996
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 5 (10) , 1103-1112
- https://doi.org/10.1016/0925-9635(95)00507-2
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Deposition of boron-nitride films by nitrogen sputtering from a boron-metal targetApplied Physics Letters, 1995
- Preparation of cubic boron nitride films by use of electrically conductive boron carbide targetsThin Solid Films, 1995
- Synthesis and structural characterization of boron nitride thin filmsThin Solid Films, 1994
- On the role of ions in the formation of cubic boron nitride films by ion-assisted depositionJournal of Materials Research, 1994
- Infrared spectroscopic investigations on h-BN and mixed h/c-BN thin filmsThin Solid Films, 1994
- Preparation of c-BN containing films by reactive r.f. sputteringDiamond and Related Materials, 1993
- Manufacture of c-BN films with improved adhesionMaterials Science and Engineering: A, 1991
- Preparation of Cubic Boron Nitride Films by RF SputteringJapanese Journal of Applied Physics, 1990
- Free-molecule Langmuir probe and its use in flow-field studies.AIAA Journal, 1966
- Cubic Form of Boron NitrideThe Journal of Chemical Physics, 1957