Modulation doping in GexSi1−x/Si strained layer heterostructures

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Abstract
We report the first observation of the modulation doping effect in Si/Ge0.2Si0.8 heterojunctions grown by molecular beam epitaxy. Peak hole mobilities of ∼3300 cm2 V−1 s−1 have been observed at 4.2 K. These values, although nonoptimum, are comparable to the best reported values for holes in Si/SiO2 inversion layers. Low temperature, angular dependent, Shubnikov–de Haas measurements have demonstrated the two‐dimensional nature of the hole gas and yield a surface carrier density of 3.5×1011 cm−2. From the temperature dependence of the Shubnikov–de Haas amplitudes a hole effective mass of 0.30±0.02mo has been derived. Identical measurements on n‐type heterojunctions having the same Ge content (x=0.2) have failed to show a sustained enhancement of mobility at low temperatures, indicating that ΔEv≫ΔEc.