Controlled Growth of Ni Particles on Si(100)1a
- 1 January 1996
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 8 (8) , 1858-1864
- https://doi.org/10.1021/cm9600440
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Allyl(?-diketonato)palladium(II) complexes as precursors for palladium filmsAdvanced Materials, 1994
- Dispersion and distribution of titanium species bound to silica from titanium tetrachlorideLangmuir, 1993
- Accelerated-Deposition Rate and High-Quality Film Copper Chemical Vapor Deposition Using a Water Vapor Addition to a Hydrogen and Cu(HFA)2 Reaction SystemJapanese Journal of Applied Physics, 1993
- Chemical Treatment Effects of Si Surfaces in NH4OH:H2O2:H2O Solutions Studied by Spectroscopic EllipsometryJapanese Journal of Applied Physics, 1993
- Magnetic properties of nanometric nickel particlesSolid State Communications, 1993
- Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursorsChemistry of Materials, 1992
- Characterization of LPCVD Aluminum for VLSI ProcessingJournal of the Electrochemical Society, 1984
- Cyclopentadienyl Metal Carbonyls and Some DerivativesPublished by Wiley ,1963
- Notiz über eine einfache Methode zur Darstellung von Niccelocen und CobaltocenEuropean Journal of Inorganic Chemistry, 1962
- Theory of the Structure of Ferromagnetic Domains in Films and Small ParticlesPhysical Review B, 1946