UHV/CVD growth of Si and Si:Ge alloys: chemistry, physics, and device applications
- 1 January 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Proceedings of the IEEE
- Vol. 80 (10) , 1592-1608
- https://doi.org/10.1109/5.168668
Abstract
No abstract availableKeywords
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