X-ray reflectivity analysis of thin TiN and TiOxNy films deposited by dual-ion-beam sputtering on (100)Si substrates
- 20 April 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 298 (1-2) , 130-134
- https://doi.org/10.1016/s0040-6090(96)09208-5
Abstract
No abstract availableKeywords
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