Step motion of the growth surface in the initial stage of semiconductor film epitaxy with ion sputtering
- 1 January 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 20 (1) , 1-10
- https://doi.org/10.1016/0040-6090(74)90027-3
Abstract
No abstract availableKeywords
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