Atomic structure of amorphous Si1−xCx films prepared by r.f. sputtering
- 1 June 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 173 (2) , 235-242
- https://doi.org/10.1016/0040-6090(89)90139-9
Abstract
No abstract availableKeywords
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