Design and process development of a novel multi-wafer OMVPE reactor for growing very uniform GaAs and AlGaAs epitaxial layers
- 1 September 1989
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 18 (5) , 603-609
- https://doi.org/10.1007/bf02657474
Abstract
No abstract availableKeywords
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