Vacuum microelectronics: what's new and exciting
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 38 (10) , 2276-2283
- https://doi.org/10.1109/16.88510
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Microfabrication of Field Emission Devices for Vacuum Integrated Circuits using Orientation Dependent EtchingMRS Proceedings, 1986
- Atom-probe study of silicide formation at Ni/Si interfacesJournal of Vacuum Science & Technology B, 1984
- Refractory metal silicides for VLSI applicationsJournal of Vacuum Science and Technology, 1981
- Refractory silicides for integrated circuitsJournal of Vacuum Science and Technology, 1980
- Energy deficits in pulsed field evaporation and deficit compensated atom-probe designsReview of Scientific Instruments, 1974
- A Thin-Film Field-Emission CathodeJournal of Applied Physics, 1968
- Cathode- and Anode-Induced Electrical Breakdown in VacuumJournal of Applied Physics, 1967
- Vacuum Voltage Breakdown as a Thermal Instability of the Emitting ProtrusionJournal of Applied Physics, 1964
- Field DesorptionPhysical Review B, 1956
- Die Abhängigkeit der Feldelektronenemission von der AustrittsarbeitThe European Physical Journal A, 1936