Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering
- 1 April 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 317 (1-2) , 326-329
- https://doi.org/10.1016/s0040-6090(97)00548-8
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 13 references indexed in Scilit:
- New multicomponent transparent conducting oxide films for transparent electrodes of flat panel displaysJournal of Vacuum Science & Technology A, 1996
- New transparent conducting MgIn2O4Zn2In2O5 thin films prepared by magnetron sputteringThin Solid Films, 1995
- Highly Transparent and Conductive Zn2In2O5 Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1995
- Properties of transparent zinc-stannate conducting films prepared by radio frequency magnetron sputteringJournal of Vacuum Science & Technology A, 1995
- Highly Transparent and Conductive Zinc-Stannate Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1994
- Preparation of MgIn2O4-X Thin Films on Glass Substrate by RF SputteringJapanese Journal of Applied Physics, 1993
- Substrate Temperature Dependence of Transparent Conducting Al-Doped ZnO Thin Films Prepared by Magnetron SputteringJapanese Journal of Applied Physics, 1992
- Conduction mechanism of highly conductive and transparent zinc oxide thin films prepared by magnetron sputteringJournal of Crystal Growth, 1992
- The Electrical and Optical Properties of the ZnO-SnO2 Thin Films Prepared by RF Magnetron SputteringPhysica Status Solidi (a), 1992
- The stability of zinc oxide transparent electrodes fabricated by R.F. magnetron sputteringThin Solid Films, 1984