Exploration of the ultimate patterning potential achievable with focused ion beams
- 31 March 2005
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 78-79, 266-278
- https://doi.org/10.1016/j.mee.2004.12.038
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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