Hydrogenated amorphous and polycrystalline silicon TFTs by hot-wire CVD

This publication has 8 references indexed in Scilit:

• Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition
  Philosophical Magazine Part B, 1997
• Stable amorphous-silicon thin-film transistors
  Applied Physics Letters, 1997
• Improved mobility of amorphous silicon thin-film transistors deposited by hot-wire chemical vapor deposition on glass substrates
  Applied Physics Letters, 1997
• Application of Hot Wire Deposited Intrinsic Poly-Silicon Films in N-I-P cells and TFTS
  MRS Proceedings, 1997
• Stability of hot-wire deposited amorphous-silicon thin-film transistors
  Applied Physics Letters, 1996
• Physics of Below Threshold Current Distribution in a-Si:H TFTs
  MRS Proceedings, 1996
• A new modular multichamber plasma enhanced chemical vapor deposition system
  Applied Surface Science, 1993
• Deposition of device quality, low H content amorphous silicon
  Journal of Applied Physics, 1991