The Mechanism of Silicon Epitaxial Layer Growth from Ion-Molecular Beams
- 16 August 1979
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 54 (2) , 463-469
- https://doi.org/10.1002/pssa.2210540204
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Step motion of the growth surface in the initial stage of semiconductor film epitaxy with ion sputteringThin Solid Films, 1974
- Epitaxial growth of silicon assisted by ion implantationRadiation Effects, 1971
- Epitaxial Growth with Light IrradiationJapanese Journal of Applied Physics, 1968
- A study of nucleation in chemically grown epitaxial silicon films using molecular beam techniques. IV. Additional confirmation of the induction period and nucleation mechanismsPhilosophical Magazine, 1968