Plasma chemistry model of DC magnetron reactive sputtering in Ar O2 gas mixtures
- 1 January 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 312 (1-2) , 341-347
- https://doi.org/10.1016/s0040-6090(97)00716-5
Abstract
No abstract availableKeywords
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