Pulse plating of quarter micron gold patterns on silicon X-ray masks
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 279-282
- https://doi.org/10.1016/0167-9317(90)90115-a
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Negative-tone high-resolution photocatalytic resist for x-ray lithographyMicroelectronic Engineering, 1989
- High sensitivity positive tone x-ray resist: RAY-PF-performance under e-beam exposureMicroelectronic Engineering, 1989
- Crirical dimension control in X-ray masks with electroplated gold absorbersMicroelectronic Engineering, 1986
- Dc Electroplating Of Sub-Micron Gold Patterns On X-Ray MasksPublished by SPIE-Intl Soc Optical Eng ,1984