SiGe growth kinetics and doping in reduced pressure-chemical vapor deposition
- 31 March 2002
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 236 (1-3) , 10-20
- https://doi.org/10.1016/s0022-0248(01)02085-1
Abstract
No abstract availableThis publication has 48 references indexed in Scilit:
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