Focused ion beam deposition of carbon for photomask repair
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 421-425
- https://doi.org/10.1016/0167-9317(90)90143-h
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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- Focused ion beam repair techniques for clear and opaque defects in masksMicroelectronic Engineering, 1985
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