Isotopic effects in a–C:(H/D) films deposited from methane/hydrogen RF plasmas
- 1 November 1990
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 5 (11) , 2451-2455
- https://doi.org/10.1557/jmr.1990.2451
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Isotopic exchange in hard amorphous carbonized layersJournal of Applied Physics, 1990
- Amorphous hydrogenated carbon films on semiconductorsApplied Physics A, 1989
- Hydrogen trapping and transport in carbonJournal of Nuclear Materials, 1989
- Electron and chemical kinetics in methane rf glow-discharge deposition plasmasJournal of Applied Physics, 1989
- Characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recordingJournal of Vacuum Science & Technology A, 1987
- Structure and physical properties of plasma-grown amorphous hydrogenated carbon filmsThin Solid Films, 1987
- Structure property relationships of carbonaceous films grown under ion enhancementJournal of Vacuum Science & Technology A, 1986
- Composition and properties of the so-called “diamond-like” amorphous carbon filmsThin Solid Films, 1984
- Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon filmsJournal of Physics D: Applied Physics, 1984
- Ionic and neutral products of an RF discharge in methaneInternational Journal of Mass Spectrometry and Ion Physics, 1975