Thin RF sputtered and thermal Ta2O5 on Si for high density DRAM application
- 1 August 1999
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 39 (8) , 1185-1217
- https://doi.org/10.1016/s0026-2714(99)00038-4
Abstract
No abstract availableKeywords
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