Silicidbildung in dünnen molybdän- und wolframschichten auf einkristallinen siliziumsubstraten bei relativ niedrigen temperaturen
- 1 September 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 37 (2) , 185-194
- https://doi.org/10.1016/0040-6090(76)90182-6
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Evaluation of glancing angle X-ray diffraction and MeV 4He backscattering analyses of silicide formationThin Solid Films, 1974
- An Investigation of the Structure of Pd[sub 2]Si Formed on SiJournal of the Electrochemical Society, 1974
- Reaction kinetics of tungsten thin films on silicon (100) surfacesJournal of Applied Physics, 1973
- Kinetics of WSi2 formation in the thin-film system W/PtSi/SiJournal of Applied Physics, 1973
- Growth Kinetics Observed in the Formation of Metal Silicides on SiliconApplied Physics Letters, 1972
- Sputtering Multilayered Conductor FilmsJournal of Vacuum Science and Technology, 1971
- Chemical Deposition of Mo on SiJapanese Journal of Applied Physics, 1968
- Temperature Changes in Thin Metal Films during Vapor DepositionJournal of Applied Physics, 1967
- Chemical Vapor Deposition of Mo onto SiJournal of the Electrochemical Society, 1967
- Vacuum Deposited Molybdenum FilmsJournal of the Electrochemical Society, 1965