Piezoelectric AlN film for SAW devices applications
- 1 January 1993
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 249-252 vol.1
- https://doi.org/10.1109/ultsym.1993.339578
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
- Stress dependence of reactively sputtered aluminum nitride thin films on sputtering parametersJournal of Vacuum Science & Technology A, 1989
- Low-temperature coefficient bulk acoustic wave composite resonatorsApplied Physics Letters, 1982
- Zero Temperature Coefficient Surface-Acoustic-Wave Devices Using Epitaxial AlN FilmsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1982
- Aluminum nitride on silicon surface acoustic wave devicesApplied Physics Letters, 1981
- High Rate Deposition of Thick Piezoelectric ZnO and AlN Films Using a New Magnetron Sputtering TechniqueJapanese Journal of Applied Physics, 1981
- Sputtered Aluminum Nitride on Silicon for SAW Device ApplicationsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1981
- Sputtered AlN Films for Bulk-Acoustic-Wave DevicesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1981
- Measurement of Thin Film Parameters with a Prism CouplerApplied Optics, 1973
- Theory of interdigital couplers on nonpiezoelectric substratesJournal of Applied Physics, 1973
- Elastic Wave Propagation in Thin LayersPublished by Elsevier ,1972