Oberflächenanalytische Verfahren zur Charakterisierung von Festkörperoberflächen und dünnen Schichten
- 1 November 1989
- journal article
- Published by Wiley in Physikalische Blätter
- Vol. 45 (11) , A-827-A-859
- https://doi.org/10.1002/phbl.19890451121
Abstract
No abstract availableThis publication has 33 references indexed in Scilit:
- High-sensitivity plasma-based sputtered neutral mass spectrometry depth profiling of zinc-implanted GaAsJournal of Vacuum Science & Technology A, 1989
- Sub‐micron molecular imaging. A viability study by time‐of‐flight SIMSSurface and Interface Analysis, 1988
- Edge effects and image contrast in scanning Auger microscopy: A theory/experiment comparisonSurface and Interface Analysis, 1988
- Analysis of inorganic materials by beam techniques — the challenge of high technologyAnalytica Chimica Acta, 1987
- Recent progress in high resolution depth profiling and interface analysis of thin filmsVacuum, 1987
- SNMS-analysis of insulatorsMicrochimica Acta, 1987
- Practical surface analysis: state of the art and recent developments in AES, XPS, ISS and SIMSSurface and Interface Analysis, 1986
- The effect of surface topography evolution on sputter profiling depth resolution in SiSurface and Interface Analysis, 1985
- Verfahrenskontrollen und komplementäre Informationen in der Oberflächenanalyse durch KombinationsgeräteAnalytical and Bioanalytical Chemistry, 1984
- A comparison of SIMS with other techniques based on ion-beam solid interactionsVacuum, 1984