Effects of surface pretreatment of polysilicon electrode prior to Si/sub 3/N/sub 4/ deposition on the electrical characteristics of Si/sub 3/N/sub 4/ dielectric films
- 1 March 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 41 (3) , 347-351
- https://doi.org/10.1109/16.275219
Abstract
No abstract availableKeywords
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