Precipitation of oxygen in single-crystal silicon implanted with high doses of oxygen
- 1 June 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 128 (1-2) , 125-131
- https://doi.org/10.1016/0040-6090(85)90340-2
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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