Kinetics of decomposition of amorphous hydrogenated silicon films
- 1 August 1979
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (8) , 5238-5241
- https://doi.org/10.1063/1.326672
Abstract
The decomposition kinetics of amorphous hydrogenated silicon films have been studied by thermomanometric analysis at constant heating rate. rf and dc‐biased rf glow‐discharge films, as well as films deposited by reactive sputtering, have been analyzed and the results used to determine the thermodynamic parameters characterizing the activation barriers for decomposition of the =SiH2 and ≡SiH centers. Conclusions regarding the structure of these films are presented on the basis of kinetic evidence and parallel infrared absorption studies.This publication has 13 references indexed in Scilit:
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