Detection of H Atoms in RF-Discharge SiH4, CH4 and H2 Plasmas by Two-Photon Absorption Laser-Induced Fluorescence Spectroscopy

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Abstract
Hydrogen atoms were detected quantitatively by a two-photon absorption laser-induced fluorescence technique in capacitively coupled and inductively coupled RF-discharge plasmas. In a parallel-plate RF-discharge reactor the density of H atoms measured in a SiH4 plasma diluted with Ar was higher than that diluted with H2. A comparison of the densities in SiH4, CH4 and H2 plasmas measured by changing dilution ratio with Ar also showed that H2 molecules were not easily decomposed and H atoms were mostly produced from decomposition of source SiH4 and CH4 molecules at low RF-power level. Spatial distribution of H atoms effused from an inductively coupled RF-discharge radical source was also measured. Its axial and radial profiles showed the expansion of H atoms towards the chamber wall by diffusion and gas flow. The absolute calibration of H atom density was carried out by a comparison with absorption of Lyα line at 121.6 nm.

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