The effects of ion bombarding energy on the structure and properties of TiN films synthesized by dual ion beam sputtering
- 15 February 1994
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 75 (4) , 2002-2006
- https://doi.org/10.1063/1.356299
Abstract
TiN films have been synthesized by dual ion beam sputtering (DIBS) deposition at the temperature below 100 °C. Ion bombardment influenced the metallographic morphology and crystalline orientation of TiN films. TiN film formed under N+ bombardment at low energy (<1 keV) consisted of fine crystal particles without texture. The film bombarded at 300 eV exhibited a hardness of 2750 kgf/mm2, which was an extremely high value for TiN films currently obtained by ion beam assisted deposition. The tribological tests demonstrated that TiN film synthesized by DIBS possessed good wear resistance.This publication has 11 references indexed in Scilit:
- Investigation of diamondlike carbon thin films synthesized by dual ion beam assisted depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- Tribology of carbonaceous films formed by ion-beam- assisted deposition of organic materialSurface and Coatings Technology, 1991
- Tribological properties of carbonized photoresistNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Formation of transition metal carbide thin films by dual ion beam deposition at room temperatureNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Preparation of TiN thin films by the dynamic mixing method using an N2+ ion beam of 1 keVThin Solid Films, 1989
- Ion beam modification of TiN films during vapor depositionMaterials Science and Engineering, 1987
- Characterisation of Nitrides Prepared by Ion Beam Enhanced Deposition of Aluminium, Silicon and TitaniumJapanese Journal of Applied Physics, 1987
- Developments in ionization assisted processesJournal of Vacuum Science & Technology A, 1985
- Summary Abstract: Ion beam control of morphology during the growth of aSiHx thin filmsJournal of Vacuum Science & Technology A, 1983
- Diffusion barriers in thin filmsThin Solid Films, 1978