Effect of Passivation on Device Stability and Gate Reverse Characteristics on 4H-SiC MESFETs
- 15 June 2004
- journal article
- Published by Trans Tech Publications, Ltd. in Materials Science Forum
- Vol. 457-460, 1177-1180
- https://doi.org/10.4028/www.scientific.net/msf.457-460.1177
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Passivation Effect on Channel Recessed 4H-SiC MESFETsMaterials Science Forum, 2003
- Gate field emission induced breakdown in power SiC MESFETsIEEE Electron Device Letters, 2003
- Slow transients observed in AlGaN HFETs: Effects of SiN/sub x/ passivation and UV illuminationIEEE Transactions on Electron Devices, 2003
- AlGaN/GaN HEMTs-an overview of device operation and applicationsProceedings of the IEEE, 2002
- SiC microwave power technologiesProceedings of the IEEE, 2002
- Enhanced power performance of enhancement-mode Al/sub 0.5/Ga/sub 0.5/As/In/sub 0.15/Ga/sub 0.85/As pHEMTs using a low-k BCB passivationIEEE Electron Device Letters, 2002
- The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETsIEEE Transactions on Electron Devices, 2001
- Metal-Nitride-Semiconductor Capacitors on 6H-SiCMaterials Science Forum, 1998
- Temperature dependence of Fowler-Nordheim current in 6H- and 4H-SiC MOS capacitorsIEEE Electron Device Letters, 1997
- Breakdown walkout in AlAs/GaAs HEMTsIEEE Transactions on Electron Devices, 1992