Electron microscopy characterization of TiN films on Si, grown by d.c. reactive magnetron sputtering
- 1 November 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 268 (1-2) , 57-63
- https://doi.org/10.1016/0040-6090(95)06692-6
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- The effects of ion bombarding energy on the structure and properties of TiN films synthesized by dual ion beam sputteringJournal of Applied Physics, 1994
- Characterization of reactively evaporated TiN layers for diffusion barrier applicationsJournal of Applied Physics, 1994
- Microstructure and electrical resistivity of TiN films deposited on heated and negatively biased silicon substratesThin Solid Films, 1994
- Fundamental mechanisms of titanium nitride formation by d.c. magnetron sputteringSurface and Coatings Technology, 1992
- Chemical and structural analyses of the titanium nitride/alpha (6H)-silicon carbide interfaceJournal of Vacuum Science & Technology A, 1992
- Deposition of TiN films with titanium interlayer on low carbon steel by reactive r.f. magnetron sputteringSurface and Coatings Technology, 1991
- Lattice distortion in thin films of IVB metal (Ti, Zr, Hr) nitridesThin Solid Films, 1991
- Titanium nitride deposition on hardened high speed steel by reactive magnetron sputteringThin Solid Films, 1990
- High Temperature microhardness of hard coatings produced by physical and chemical vapor depositionThin Solid Films, 1987
- Structure and properties of TiN coatingsThin Solid Films, 1985