Influence of the reactive gas flow on chromium nitride sputtering
- 1 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 59 (1-3) , 135-139
- https://doi.org/10.1016/0257-8972(93)90070-5
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Ion bombardment of AlN films deposited in a reactive sputtering process with accurate control of the mass flow of the reactive gasSurface and Coatings Technology, 1992
- The influence of the reactive gas flow on the properties of AIN sputter-deposited filmsMaterials Science and Engineering: A, 1991
- Properties of Crn and (Ti, Al)N Coatings Produced by High Rate Sputter DepositionSurface Engineering, 1987
- Hard chrome coatings deposited by physical vapour depositionThin Solid Films, 1983