Direct Observation of Species Liberated from GaAs Native Oxides during Atomic Hydrogen Cleaning

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Abstract
A real-time mass spectroscopic observation of liberated species was carried out to investigate the mechanism of atomic-hydrogen-( H•)-induced deoxidation of GaAs native oxides. Atomic hydrogen treatment at 410°C caused, initially, the liberation of molecular arsenic ( As2/As4), resulting in the removal of As oxides, which was then followed by the liberation of Ga2O, leading to complete deoxidation. These results indicate that the deoxidation proceeds through two stages. The main chemical reactions are As2O x +2 x H•→ x H2O+ As2/(1/2As4) in the first stage and Ga2O3+ 4H•→2H2O+ Ga2O in the second stage.