Recent advances in resists for 157 nm microlithography
- 1 March 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (2) , 531-536
- https://doi.org/10.1116/1.1450589
Abstract
The synthesis and characterization of several new fluoropolymers designed for use in the formulation of photoresists for exposure at 157 nm will be described. The design of these platforms has in some cases been inspired by ab initio quantum mechanical calculations of excited state transition energies and by interpretation of gas phase VUV spectrophotometric data. We have explored anionic polymerizations, free radical polymerizations, metal-catalyzed addition polymerizations and metal-catalyzed copolymerizations with carbon monoxide in these studies. The polymers and resist formulations were characterized by VUV spectrometry and variable angle spectroscopic ellipsometry (VASE). Resist formulations based on these polymers were exposed at the 157 nm wavelength to produce high-resolution images that will be presented.Keywords
This publication has 13 references indexed in Scilit:
- Resist materials for 157-nm microlithography: an updatePublished by SPIE-Intl Soc Optical Eng ,2001
- Polymer design for 157-nm chemically amplified resistsPublished by SPIE-Intl Soc Optical Eng ,2001
- Fluoropolymer Resist Materials for 157nm Microlithography.Journal of Photopolymer Science and Technology, 2001
- 157 nm resist materials: Progress reportJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Polymers for 157-nm photoresist applications: a progress reportPublished by SPIE-Intl Soc Optical Eng ,2000
- 157 nm Resist Materials: A Progress Report.Journal of Photopolymer Science and Technology, 2000
- Outlook for 157-nm resist designPublished by SPIE-Intl Soc Optical Eng ,1999
- Design Considerations for 193-nm Positive ResistsPublished by American Chemical Society (ACS) ,1995
- Anionic Polymerization of α-(Trifluoromethyl)AcrylatePublished by Springer Nature ,1987
- Postirradiation polymerization of e-beam negative resists: Theoretical analysis and method of inhibitionJournal of Vacuum Science and Technology, 1981