InGaAsP (1.3 μm) grown by liquid-phase epitaxy in the V groove of a channeled InP substrate: A photoluminescence study

Abstract
The photoluminescence characteristics of a 1.3-μm undoped n-type InGaAsP grown lattice matched by liquid-phase epitaxy in the V grooves of a channeled InP substrate are compared with that grown over a planar substrate. In the 5.5 K photoluminescence spectrum, for both types of growth the epitaxial layer exhibits two well-defined and sharp (FWHM∼7–8 meV) bands at 1.016 and 0.99 eV. Both peaks are assigned to band-edge luminescence arising from two different compositions in the epilayer, the 0.99-eV peak arising solely from a transient growth region present near the substrate–epi interface. It is found that the transient growth region can be enhanced in the V channels perhaps due to additional perturbations due to growth on nonplanar substrates.