The influence of preparation parameters on the deposition rate, density and optical properties of thin hydrogenated amorphous silicon films prepared by r.f. glow discharge
- 1 June 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 149 (3) , 331-340
- https://doi.org/10.1016/0040-6090(87)90396-8
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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