Low-Temperature Fabrication of Si Thin-Film Transistor Microstructures by Soft Lithographic Patterning on Curved and Planar Substrates
- 11 October 2000
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 12 (11) , 3306-3315
- https://doi.org/10.1021/cm000480t
Abstract
No abstract availableKeywords
This publication has 43 references indexed in Scilit:
- Stability of low-temperature amorphous silicon thin film transistors formed on glass and transparent plastic substratesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Patterned polymer growth on silicon surfaces using microcontact printing and surface-initiated polymerizationApplied Physics Letters, 1999
- Low-voltage 0.1 μm organic transistors and complementary inverter circuits fabricated with a low-cost form of near-field photolithographyApplied Physics Letters, 1999
- Octadecyltrichlorosilane self-assembled-monolayer islands as a self-patterned-mask for HF etching of SiO2 on SiJournal of Vacuum Science & Technology A, 1998
- Low temperature fabrication of amorphous silicon thin film transistors by dc reactive magnetron sputteringJournal of Vacuum Science & Technology A, 1997
- Polymeric Self-Assembled Monolayers. 4. Chemical, Electrochemical, and Thermal Stability of ω-Functionalized, Self-Assembled Diacetylenic and Polydiacetylenic MonolayersJournal of the American Chemical Society, 1997
- Self-assembled monolayer resists and nanoscale lithography of silicon dioxide thin films by chemically enhanced vapor etching (CEVE)Superlattices and Microstructures, 1996
- Pattern transfer: Self-assembled monolayers as ultrathin resistsMicroelectronic Engineering, 1996
- Polymeric Self-Assembled Monolayers. 3. Pattern Transfer by Use of Photolithography, Electrochemical Methods, and an Ultrathin, Self-Assembled Diacetylenic ResistJournal of the American Chemical Society, 1995
- Chemical Vapor Surface Modification of Porous Glass with Fluoroalkyl-Functionalized Silanes. 2. Resistance to WaterLangmuir, 1995