Strain relaxation during the surfactant modified epitaxial growth of Ge/Si(001)
- 15 June 1992
- journal article
- Published by Elsevier in Surface Science
- Vol. 273 (1-2) , 1-8
- https://doi.org/10.1016/0039-6028(92)90270-g
Abstract
No abstract availableKeywords
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