Dual-gate a—Si:H thin film transistors
- 1 December 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 3 (12) , 357-359
- https://doi.org/10.1109/edl.1982.25599
Abstract
Dual-gate accumulation mode thin film transistors have been fabricated for the first time in a-Si:H on bulk glass substrates. The devices display exceptionally high performance, as compared to previously reported single-gate a-Si:H transistors. For a channel length of 10 µm and width of 168 µm, drain currents in the range of 5-10 µA were obtained for gate biases of 15 V in both of the two conducting channels induced in the a-Si:H layer. The drain current of the TFT operating in the dual-gate mode was found to be larger than the arithmetic sum of the drain currents through the two individual channels obtained from single-mode operation. A significant difference in dc stability between the two channels was observed. The use of the dual-gate TFT as a diagnostic structure for studying interface properties and contact effects has been demonstrated.Keywords
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