Study on cat-CVD poly-Si films for solar cell application
- 30 November 1997
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 48 (1-4) , 279-285
- https://doi.org/10.1016/s0927-0248(97)00112-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Hall Mobility of Low-Temperature-Deposited Polysilicon Films by Catalytic Chemical Vapor Deposition MethodJapanese Journal of Applied Physics, 1994
- Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) MethodJapanese Journal of Applied Physics, 1991
- Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2Applied Physics Letters, 1985