Novel photochemical vapor deposition reactor for amorphous silicon solar cell deposition
- 13 July 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 51 (2) , 133-135
- https://doi.org/10.1063/1.98592
Abstract
A novel photochemical vapor deposition (photo‐CVD) reactor having a flexible ultraviolet‐transparent Teflon curtain and a secondary gas flow to eliminate deposition on the window has been used to deposit amorphous silicon films and p‐i‐n solar cells. The background levels of atmospheric contaminants (H2O, CO2, N2) depend strongly on the vacuum procedures but not on the presence of a Teflon curtain in the reactor. Intrinsic films with a midgap density of states of 3×1015 eV−1 cm−3 and all‐photo‐CVD pin solar cells with efficiencies of 8.5% have been deposited.Keywords
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