Sheath properties of RF plasmas in a parallel plate etch reactor; the high-frequency regime (ω>ωi)
- 14 November 1989
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 22 (11) , 1650-1657
- https://doi.org/10.1088/0022-3727/22/11/014
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
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