Improved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution process
- 15 January 2008
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 516 (5) , 568-571
- https://doi.org/10.1016/j.tsf.2007.06.049
Abstract
No abstract availableKeywords
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