Fourier Transform Infrared Spectroscopic Study of Oxide Films Grown in Pure N2O
- 1 May 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (5R) , 2370-2373
- https://doi.org/10.1143/jjap.34.2370
Abstract
The properties of the oxide films grown by pure N2O were studied in this work. A two-layer model, considering a N2 O oxide with an oxy-nitride film at the interface, was used to describe the dependence of the main peak shift in a Fourier transform infrared (FTIR) spectrum on N2O thicknesses. The thickness of interfacial layer was determined by FTIR and multiple-angle incident ellipsometer. Both methods showed consistent results and the thickness of this layer is found to be 14-16 Å.Keywords
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