Study on quasiperiodic Ta/Al multilayer films by x-ray diffraction

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Abstract
Quasiperiodic (Fibonacci) Ta/Al multilayer films with Ta(110) and Al(111) textures were fabricated by magnetron sputtering. The structure of the multilayers was characterized in detail by x-ray diffraction. The diffraction peaks at low and high angles can be indexed by the projection method from the high-dimension periodic structure. The experimental results were in good agreement with the numerical calculation using the model for the compositionally modulated multilayers. The diffraction spectrum of the quasiperiodic Ta/Al multilayers is totally different from that of periodic structure, and the possible application of Fibonacci films as optical elements in a soft x-ray region is discussed.