Cathodic arc deposition of TiN and Zr(C, N) at low substrate temperature using a pulsed bias voltage
- 1 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 140, 830-837
- https://doi.org/10.1016/0921-5093(91)90521-n
Abstract
No abstract availableKeywords
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