Reactive ion beam etching characteristics of LiNbO3
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 19-20, 1018-1021
- https://doi.org/10.1016/s0168-583x(87)80202-1
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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- A reactive ion beam etching and coating systemNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
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- Microfabrication of LiNbO3 by Reactive Ion-Beam EtchingJapanese Journal of Applied Physics, 1980
- Ridge waveguides and electro-optical switches in LiNbO3fabricated by ion-bombardment-enhanced etchingIEEE Transactions on Circuits and Systems, 1979
- CF4 plasma etching on LiNbO3Applied Physics Letters, 1979