Atomic Computer Simulations of Defect Migration in 3C and 4H-SiC
- 15 June 2004
- journal article
- Published by Trans Tech Publications, Ltd. in Materials Science Forum
- Vol. 457-460, 457-460
- https://doi.org/10.4028/www.scientific.net/msf.457-460.457
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Recovery of close Frenkel pairs produced by low energy recoils in SiCJournal of Applied Physics, 2003
- Identification and Annealing of Common Intrinsic Defect CentersMaterials Science Forum, 2003
- Identification of Dumb-Bell Shaped Interstitials in Electron Irradiated 6H SiC by Photoluminescence SpectroscopyMaterials Science Forum, 2003
- Effects of implantation temperature and ion flux on damage accumulation in Al-implanted 4H-SiCJournal of Applied Physics, 2003
- Damage evolution and recovery on both Si and C sublattices in Al-implanted 4H–SiC studied by Rutherford backscattering spectroscopy and nuclear reaction analysisJournal of Applied Physics, 2002
- Empirical potential approach for defect properties in 3C-SiCNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2002
- Accumulation, dynamic annealing and thermal recovery of ion-beam-induced disorder in silicon carbideNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2001
- Proton Irradiation Induced Defects in 611- and 4H-SiCMRS Proceedings, 1998
- Influence of irradiation spectrum and implanted ions on the amorphization of ceramicsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1996
- Study of copper precipitates in α‐iron by computer simulation I. Interatomic potentials and properties of Fe and CuPhilosophical Magazine A, 1995