Oxidation of lead by low energy O2+ bombardment
- 31 July 1972
- journal article
- Published by Elsevier in Surface Science
- Vol. 32 (1) , 222-230
- https://doi.org/10.1016/0039-6028(72)90130-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Analysis of amorphous layers on silicon by backscattering and channeling effect measurementsSurface Science, 1970
- Oxidation of vacuum deposited films of leadSurface Science, 1968
- Formation of SiO2 Films by Oxygen-Ion BombardmentJapanese Journal of Applied Physics, 1966
- Reaction of Oxygen with Evaporated Films of LeadThe Journal of Physical Chemistry, 1964
- SELF-DIFFUSION OF OXYGEN IN LEAD OXIDE1The Journal of Physical Chemistry, 1963