Surface and thin film analysis in silicon technology: actual and future problems and demands
- 1 January 1989
- journal article
- Published by Springer Nature in Analytical and Bioanalytical Chemistry
- Vol. 333 (4-5) , 561-568
- https://doi.org/10.1007/bf00572377
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Surface analytical characterization of oxide-free Si(100) wafer surfacesAnalytical and Bioanalytical Chemistry, 1989
- Technologie hochintegrierter SchaltungenPublished by Springer Nature ,1988
- Reactive-Ion EtchingPhysics Today, 1986
- Growth and properties of single crystal TiN films deposited by reactive magnetron sputteringJournal of Vacuum Science & Technology A, 1985
- Investigation of Tin films reactively sputtered using a sputter gunThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film compositionThin Solid Films, 1983
- A highly sensitive energy-dispersive X-ray spectrometer with multiple total reflection of the exciting beamNuclear Instruments and Methods in Physics Research, 1982
- Interfacial reactions between aluminum and transition-metal nitride and carbide filmsJournal of Applied Physics, 1982
- Diffusion barriers in thin filmsThin Solid Films, 1978
- Zur bestimmung der reduzierten dicke D/λ dünner Schichten mittels XPSJournal of Electron Spectroscopy and Related Phenomena, 1978