Effect of annealing and light exposure on the field-effect density of states in glow-discharge a-Si: H
- 1 April 1982
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 45 (4) , 407-434
- https://doi.org/10.1080/01418638208227448
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Light-induced dangling bonds in hydrogenated amorphous siliconApplied Physics Letters, 1981
- Recent developments in amorphous silicon solar cellsSolar Energy Materials, 1980
- Characterized of glow-discharge deposited a-Si:HSolar Energy Materials, 1980
- Determination of the density of gap states: field effect and surface adsorptionSolar Cells, 1980
- Light-induced effects in Schottky diodes on hydrogenated amorphous siliconApplied Physics Letters, 1980
- Analysis of field-effect and capacitance–voltage measurements in amorphous semiconductorsPhilosophical Magazine Part B, 1980
- Determination of the density of states of a-Si:H using the field effectJournal of Non-Crystalline Solids, 1980
- Hydrogen evolution and defect creation in amorphous Si: H alloysPhysical Review B, 1979
- Electronic density of states in discharge-produced amorphous siliconApplied Physics Letters, 1979
- Optically induced electron spin resonance in doped amorphous siliconSolid State Communications, 1977