Homoepitaxial growth of diamond thin films by electron cyclotron-resonance microwave plasma chemical-vapor-deposition apparatus with CO/H2 gaseous source

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Abstract
Homoepitaxy of the diamond thin films has been carried out by employing the ECR microwave plasma CVD apparatus with a CO/H2 gaseous source. From RHEED observation, it appeared that the surface morphology of (100) oriented film was much better than that of the (110) oriented. The (2×1) surface reconstruction remained unchanged even when the film was cooled down in H2 ambient after the epitaxy was completed. Although the synthetic diamond substrates had nonuniformity in their cathodoluminescence patterns, epitaxial films grown onto them offered uniform ones.